Process Information
AZ Positive Photoresist - AZP4000
(PDF, 387K)
AZ Developer, 400K, and 421K Inorganic Developers
(PDF, 77K)
KOH Etching
(PDF, 46K)
Nano Acryl Strip
(PDF, 71K)
Negative Lithography AZ5214E Resist
(PDF, 116K)
Photolithography Basics
(PDF, 60K)
Positive AZ 5214E Resist Lithography
(PDF, 96K)
Piranha Etch General Instructions
(PDF, 64K)
Shipley Microposit 1800 Positive Resist
(PDF, 2.3MB)
Silicon Oxide Etch Process
(PDF, 53K)
Spin Coating Process
(PDF, 220K)
SU8 Negative Tone PhotoResist Process Protocol, SU8 Formulations 2002-2025
(PDF, 88K)
SU8 Negative Tone PhotoResist Process Protocol, SU8 Formulations 2035-2100
(PDF, 84K)
Tooling Factor Calculation for the Thermal Evaporator
(PDF, 32K)