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CEPSR Clean Room Equipment List
Deposition
Dry Etch
Metrology
Lithography
Miscellaneous
Thermal Deposition
Sputter Deposition
Chemical Vapor Deposition
E-Beam Evaporation
Atomic Layer Deposition
Edwards BOC/Auto 306 #1
Thermal Evaporator
Edwards BOC/Auto 306 #2
Thermal Evaporator
AJA International Rapier 700
Sputter System
Cressington Manual Sputter Coater
SEM Sputter System
Oxford PlasmaPro NPG80 PECVD
Plasma Enhanced Chemical Vapor Deposition System
Nanonex Ultra-100
Integrated UV-Ozone Cleaner / Molecular Vapor Coater
Semicore 2000
E-Beam Evaporation System
Angstrom EvoVac Deposition System
E-Beam, Thermo, and Sputter Deposition
Cambridge Nano Tech Inc. Savannah 200
Atomic Layer Deposition System
Oxford PlasmaLab 80 Plus
ICP 65
Technics Series 800
RIE (Oxygen Plasma Asher)
UVOCs
UV Ozone Cleaner
Diener Plasma Etch System
Oxygen and Hydrogen Plasma Etch System
Dektak 3
Profilometer
Nikon Eclipse
Optical Microscope with INSIGHT Digital Camera and archival software
Rudolph EL III
Ellipsometer
Hitachi S5000
Cold Cathode Field Emission SEM
WyKo NT9100
Optical Profiler
Photolithography
E-Beam Lithography
Imprint Lithography
Laser Writing
Süss MicroTec MJB3 #1
Mask Aligner 365nm/405nm
Süss MicroTec MJB3 #2
Mask Aligner
Süss MicroTec MA6
Mask Aligner
FEI
E-Beam Writer
LEO
E-Beam Writer
Nanonex Imprinter
Nano Print Lithography Tool
Heidelberg µPG 101 Laser Writer (1 micron)
Laser Writer
Heidelberg µPG 101 Laser Writer (3 micron)
Laser Writer
Packing
Resist Development
Westbond 7476 D
Wire Bonder
Westbond 7477 E
Wire Bonder
Kulicke & Soffa Die Slicer
YES Yield III
Vapor Prime Oven
Laurell WS-400Bz-4NPP-Lite
Single Wafer Spin Processor
Bal-Tec Critical Point Dryer
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