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2-5-09

November 2011

New Oxford PlasmaPro NPG80 PECVD has been installed in Clean Room:

The PlasmaPro® NGP80 PECVD is a modular plasma processing system, which can be configured to carry out reactive ion etching (RIE), plasma enhanced chemical vapour deposition (PECVD) or plasma etching (PE). A large range of options is Oxford PECVDavailable to precisely tailor the system to the customer's requirements. The system features a small footprint and a convenient open loading design. The PlasmaPro® NGP80 can process a wide range of substrate sizes, from small wafer pieces up to 200 mm (8") diameter wafers.

The substrates to be processed are manually loaded onto a table within an aluminium vacuum chamber. This chamber is evacuated by a pumping module, which can be supplied in various configurations to suit the required process. A precise flow of one or more process gases is then supplied to the chamber from a gas pod, which is usually located remotely from the main system.

The system uses radio frequency (RF) power to create a plasma inside the process chamber. The reactive ionic species generated within the plasma are guided onto the front surface of the substrate. The deposition or etch process can be varied by altering the plasma conditions, the source gas for the plasma, the vacuum pressure, the substrate temperature, and various other parameters.

October 2011

New Agilent 8500 FE-SEM installed in Clean Room:

The Agilent 8500 FE-SEM is a compact field emission scanning electron microscope (SEM) for imaging a variety of nanoscale objects and materials. The Software Interface is a PC-based interface
that provides point-and-click operation, configuration and status monitoring of the system.

Agilent

July 2011

The CEPSR Clean Room has hired Natalia Baklitskaya (nab2125@columbia.edu) to our Staff. Please help to welcome her by either stopping by the office or sending an e-mail to introduce yourself.

December 2010

New Heidelberg μPG101 (3μ) Laser Writer installed in Clean Room:

The CEPSR Clean Room has installed a new 3μ Heidelberg Laser Writer. This differs from our original 1μ Laser Writer and will write masks and wafers down to the 3 micron feature size. This will aid in writing speed for those users who do not need the resolution of the 1 micron Heidelberg Laser Writer. Equipment Page Link

AUGUST 2010

New Angstrom EvoVac Deposition System installed in Clean Room:

The Clean Room has recently acquired a new EvoVac Deposition System from Angstrom Engineering. This EvoVac Multi-Process thin film deposition system allows sample coating using a variety of deposition techniques within the same machine. The capabilities of the EvoVac system include: thermal resistive evaporation, electron beam evaporation, sputter deposition, deposition control, substrate capability, and a load lock. Please visit the Equipment Page for more information about the Angstrom EvoVac Deposition System.



APRIL 2010

New Suss MicroTec MA6 Mask Aligner installed in Clean Room:

The Clean Room has installed a new Suss MicroTec MA6 Mask Aligner. This new tool helps the CEPSR Clean Room improve our Photolithography capabilities. This tool expands our wafer size and mask size capabilities but also handles small pieces which helps us accommodate all types of research needs. The MA6 is designed for all standard lithography applications. For thick resist MEMS applications the SUSS MicroTec MA6 offers high quality exposure optics for high resolution and optimum edge quality. Please visit the Equipment Page for more information.

Suss MA6 Mask Aligner

JANUARY 2010

New Heidelberg μPG101 (1μ) Laser Writer installed in Clean Room:
The Clean Room has installed a new Heidelberg Laser Writer. This new piece of equipment will aid the Clean Room in writing masks and wafers down to the 1 micron feature size.

uPG101uPG101 1-22-10

1 micron lines (written January 22nd, 2010)

uPG101

The new μPG101 Laser Writer installed into the Clean Room has some features and options that include: Multi layer writing, Substrates up to 100 x 100 mm2, Structures down to 1 μm, Address grid down to 40 nm, Vector and Raster exposure mode, 3D exposure mode, Standard or UV laser source, Multiple data input formats (DXF, CIF, BMP), Camera system for alignment, Software development kit. These features will definitely help the Clean Room Users with their research and this new tool helps round out our excisting lithography capabilities. This also gives us the cabability of writing our own masks. Standard substrates for masks are chromium coated plates of float glass or quartz (depending on the requirements concerning temperature stability) with anti-reflection layer (e.g., chromium-oxide). We will be able to use our standard 405 nm and 375 nm wavelength photoresists and developers with up to 5 inch silicon wafers or glass. The laser writer was installed into the larger of our two Yellow Rooms for ease of resist development. Please visit the Equipment Page Link for more information.

New Veeco/Wyko NT9100 Optical Profiler installed in Clean Room:
The Clean Room has installed a new Wyko NT9100 Optical Profiler. Please visit the Equipment Page Link for more information.

NT9100

Matt

Donated SEM from IBM Research installed in Clean Room:
We have installed and qualified the Hitachi S-5000 FESEM into the Clean Room. Please visit the Equipment Page Link for more information.

Hone

DECEMBER 2009

Newly donated Hitachi S-5000 FESEM from IBM Research:
We have graciously accepted this donation from IBM Research in East Fishkill. The logistics are moving along without any problems or delays. We will replace the existing Hitachi 800 with the 5000. Service contracts will be prorated and transferred over. The de-install and packing up of the 800 and the 5000 took place this week both here at Columbia and in East Fishkill. The riggers are set to make the move the middle of next week. The following week of the 24th Hitachi will be installing and qualifying the 5000 in the Clean Room. An onsite survey was completed by Hitachi two months ago with no issues. When the 5000 is qualified, Hitachi will train staff and a select few super users on the scope and we will move forward. We are also in the process of possibly donating the 800 to Rutgers University.

PMMA Supplied and Distributed by the Clean Room:
We have implemented the supply and distribution of PMMA for our E-Beam Writers. We have purchased a new OSHA approved flammable storage refrigerator and a dispenser for dispensing the PMMA from the factory bottles into small containers for storage and subsequent distribution to researchers with the least amount of contamination possible. We currently supply 495 2A, 4A, and 6A as well as 900 2A, 4A, and 6A PMMA resist (we also supply the developer).

New Cressington Sputter Coater in operation:
The newly installed tabletop sputter coater for SEM has been in operation for a few months now and it has been much appreciated by those who use it to coat for SEM work. The Clean Room currently supplies a gold target but a research group has purchased a nickel CEPSR CRtarget for their use but obviously many different targets are available for purchase and use.

PECVD repaired and in the process of qualification:
The Nitride and Oxide CVD has been repaired and brought back to life. We are in the process of qualifying, tweaking, and writing recipes for the best optimization of this tool. We need to make some modifications to a couple of the supply process gasses and some small hardware additions (valves for better control, but the process is moving along and we will have a better more useful PECVD when work is completed.

Super Users Committee formed and implemented:
The new Equipment Super Users Committee was implemented and they had their first meeting earlier this week. Linus will be running this committee. The super user will be responsible for equipment certifications as well as some other small responsibilities that might include installation of consumable parts such as filaments or crystals, keeping an eye on how the equipment is performing, logbook maintenance, etc... This will definitely help lighten the load for both Linus and myself and the members are given some privileges as well so they are also compensated. One of the newly implemented fringes is that they have an additional two days signup capability over the other users in the new Equipment signup Calendar System. The regular user has only two days advanced signup time but the Super Users will have four days. This will also help them book the tool for certifications but they may use this for other work as well and on any equipment not just the one they own.

Rebuilt 100X Microscope installed:
We have added a refurbished optical microscope to our repertoire. It is manufactured by Leitz Ergolux and is comparable to the Nikon Eclipse that we currently have and includes backlighting as well. Due to the demand on that scope (actually people use the Clean Room for the Nikon scope only at no charge) it is much needed. We still need to add a camera and data capturing capabilities but it CEPSR CR 08still lightens the load without this feature already. In the near future a newer set of data capture hardware and software will be installed on a PC that will be able to handle the load of better software demand.

Other Incoming Tools on the Horizon:
In addition to a couple of peripheral additions to the Nanonex in the near future we plan to install a new Profilometer, E-beam Evaporator/Sputter Coater, Mask Aligner, and a Laser Writer for mask development.

Horst Stormer leaves the Clean Room:
As I am sure all of you know, Horst has moved forward in his endeavors. He let me know a couple of months ago that his last student had moved through the Clean Room and his CR account was to be closed. I did not get a chance to work with Horst but I know he was a major architect/engineer of the CEPSR Clean Room. I am sure he will be missed. We have decommissioned his group's chemicals, tooling, and storage. The storage space was gobbled up quickly.

CEPSR CR 02

JANUARY 2009

CEPSR Clean Room goes online with new website:
A new website has been developed for the CEPSR Clean Room. This new site will provide a much more dynamic, informative, secure, and productive environment for research at Columbia University. We ask that all current Clean Room Users, Research Members, and Professors register in order to access the other site functions such as forums, Clean Room access information, contact information, and process information. Please register here. We expect that you will have suggestions for this new website and we encourage you to send your suggestions or any questions concerning the website contents or structure to the web masters. Also please send us any news items that you wish to have published on the Clean Room News Page. Your request will be considered. This is a dynamic website and it has plenty of room for new ideas, concepts, data, SEM pictures, etc... for the clean room environment to share securely.

New software upgrade to the FEI beam writer:
A new software upgrade has been made on the FEI beam writer.

Honoring 40 Years of Contributions by Richard M. Osgood, Jr:
http://www.ee.columbia.edu/seminars/2008-2009/spring/osgood_symposium/seminar.html

New Plasma Asher added to Clean Room equipment list:
We have recently added a new Plasma Asher to the Clean Room. This new Tool is currently being qualified and will be ready for use soon.

Linus Fetter hired:
Linus Fetter was recently hired as a Process Engineer. Linus has an extensive career in process development working at bell labs for twenty years. Among other responsibilities Linus will be working with the research members and students with their process development. Please contact Linus with any process questions or just to welcome him to the CISE Clean Room Community. Linus Fetter.

New IP security surveillance system installed in Clean Room:
A new IP security surveillance system has been installed into the Clean Room. Nine cameras were installed in various areas of the clean room. This will help the clean room staff provide a secure, safe, and productive environment.

CEPSR CR 03